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  1. MultiCPM - Simultaneous Real Time Multi-Chamber - Multi diagnosis monitor

    The MULTISEM design concept is based on an open parallel architecture consisting of a central supervisor control unit, and a network of analytical substations
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    Horiba1
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    Jobin Yvon1
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    etch rate1
    thin film monitors1
    Digitwin0
    plasma characterisation0

    www.multisem.com - 2009-02-13

  2. RiExaminer.com | Ri Examiner | Tasmania Tourist Bureau | Rie | Used Plasmatherm Rie

    if(window.top != window) { document.write(' '); } document.write(' '); RiExaminer.com Related Searches: Ion Etching Etch Back Etch Equipment Reactive Ion Etch ...
    Plasma2
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    Metal Etch1
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    Aluminum Etch0
    Etch Equipment0
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    Silicon Anisotropic Etch0
    STS Multiplex Rie0
    Tasmania Tourist Bureau0
    Used Plasmatherm Rie0

    www.riexaminer.com - 2009-02-13

  3. DIGILEM - Interferometric Endpoint Detector & Thin Film Monitor

    Interferometry is a powerful technique that can be used for endpoint detection of planar layer and trench etching, or deposition
    plasma2
    semiconductor2
    semiconductors2
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    etch1
    interference1
    Sofie1
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    end point systems1
    endpoint systems1
    etch rate1
    thin film monitors1
    Digilem0
    etching control0
    semiconductor characterisation0

    www.digilem.com - 2009-02-08

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